充氧口位置直接影响了真空室内的氧气分布，进而对薄膜的光学性能造成重要影响。为了研究充氧口位置对HfO2薄膜性质的影响，在2个典型的充氧口位置采用电子束蒸发技术在石英基底上沉积了HfO2单层膜，并结合紫外-可见光分光光度计和X射线光电子能谱仪研究了不同充氧口位置下制得的HfO2薄膜的光学性能和化学成分。实验结果表明，将充氧口设置在基片附近更有利于得到致密性好、氧化充分的HfO2薄膜。根据实际真空室的构造建立简化的模型，应用k-ε二次方程湍流模型对镀膜过程中的氧气分布进行了三维数值模拟计算。模拟计算的结果很好地解释了实验结果。

研究了SiO2薄膜的微结构与水吸收特性之间的内在联系,分别在Si、Al2O3和JGS3基底应用电子束蒸发沉积SiO2薄膜。实验用原位傅里叶红外漫反射光谱（in-situ DRIFTS）检测薄膜水吸收特性，并结合原子力显微镜（AFM）进行微结构分析。实验发现：常温吸附状态时，薄膜表面的孔隙数目越多，SiO2薄膜水吸收量越大；薄膜表面粗糙度影响薄膜水吸收特性；升温过程薄膜出现退吸附现象以及蓝移效应。

摩擦系数是表征光学玻璃抛光特性的重要参量，平均摩擦系数决定了抛光速率，摩擦系数的变化范围影响光学玻璃的面形精度和表面粗糙度。通过正交实验，研究了抛光过程中实验因素对磷酸盐激光玻璃和光学沥青抛光胶之间摩擦特性的影响。极差分析结果表明，实验因素对平均摩擦系数大小和摩擦系数变化范围影响的显著程度相同。其中，加载压力影响较大，而沥青抛光胶胶号影响较小。在本实验中高的平均摩擦系数对应着大的摩擦系数变化范围。另外，从粘滑摩擦、粘附、磨料磨削和抛光液液膜方面进行了分析，对引起摩擦系数随时间变化的诱因进行了探讨。

基于膜层结构的弛豫现象，建立了一个多晶膜的应力演化模型，并通过线性组合给出了复合膜的生长应力模型。利用双光束基底曲率测量装置实时测量了电子束蒸发氧化铪、氧化硅多晶膜及其复合膜的应力演化过程，并对测量结果进行了拟合分析。

利用电子束热蒸发技术在不同氧分压和烘烤温度下镀制了一系列TiO2单层膜，采用表面热透镜技术测量了样品在1064 nm处的弱吸收值，并用激光损伤测试平台测量了样品的抗激光损伤阈值(LIDT)特性。实验结果表明较高的氧分压和较低的烘烤温度能显著减小薄膜的吸收值。不过薄膜在基频下的损伤阈值除了受到薄膜吸收值的影响外，还取决于基底表面的杂质密度，当薄膜吸收较大时，本征吸收对损伤破坏起到主要作用；随着薄膜的吸收逐渐减小，基底表面处的缺陷吸收逐渐取代本征吸收成为影响薄膜损伤阈值的主导因素。

Plasma scalding is one of the most typical laser damage morphologies induced by a nanosecond laser with a wavelength of 1053nm in HfO₂=SiO₂ multilayer films. In this paper, the characteristics of plasma scalds are systematically investigated with multiple methods. The scalding behaves as surface discoloration under a microscope. The shape is nearly circular when the laser incidence angle is close to normal incidence and is elliptical at oblique incidence. The nodular-ejection pit is in the center of the scalding region when the laser irradiates at the incidence angle close to normal incidence and in the right of the scalding region when the laser irradiates from left to right at oblique incidence. The maximum damage size of the scalding increases with laser energy. The edge of the scalding is high compared with the unirradiated film surface, and the region tending to the center is concave. Plasma scald is proved to be surface damage. The maximum depth of a scald increases with its size. Tiny pits of nanometer scale can be seen in the scalding film under a scanning electronic microscope at a higher magnification. The absorptions of the surface plasma scalds tend to be approximately the same as the lower absorptions of test sites without laser irradiation. Scalds do not grow during further illumination pulses until 65 J=cm². The formation of surface plasma scalding may be related to the occurrence of the laser-supported detonation wave.

利用中心波长1064 nm、脉宽12 ns、重复频率5 Hz的NdYAG激光系统，对800 nm、0° Ta2O5/SiO2高反膜进行三种能量台阶数的激光预处理扫描改性；控制扫描速度使辐照脉冲能量重叠70%的峰值能量，辐照模式1-on-1。利用Ti：sapphire激光系统输出800 nm、135 fs超短脉冲激光进行损伤测试。结果表明，纳秒激光表面改性并未提高Ta2O5/SiO2膜飞秒激光诱导损伤阈值，三种台阶数的预处理改性均使Ta2O5/SiO2膜的阈值降低20%以上。说明缺陷(本征的或激光诱导产生的，如带间电子态)对氧化物介质膜的飞秒损伤过程有重要贡献，而这种贡献在样品经过纳秒激光改性后得以体现。

对光学薄膜的性能及制备技术等方面进行了简要的评述，并指出随着科学技术的进步，光学薄膜及相关技术不论从广度还是深度来看都得到了显著发展。

The roles of laser-induced defects and native defects in multilayer mirrors under multi-shot irradiation condition are investigated. The HfO2/SiO2 dielectric mirrors are deposited by electron beam evaporation (EBE). Laser damage testing is carried out on both the 1-on-1 and S-on-1 regimes using 355-nm pulsed laser at a duration of 8 ns. It is found that the single-shot laser-induced damage threshold (LIDT) is much higher than the multi-shot LIDT. In the multi-shot mode, the main factor influencing LIDT is the accumulation of irreversible laser-induced defects and native defects. The surface morphologies of the samples are observed by optical microscopy. Moreover, the number of laser-induced defects affects the damage probability of the samples. A correlative model based on critical conduction band (CB) electron density (ED) is presented to simulate the multi-shot damage behavior.

结合本实验室及国内外同行的工作进展，概括性地介绍了光学薄膜中节瘤缺陷的生长特性、结构特征和损伤特性，以及激光预处理和破坏修复技术的研究进展。节瘤种子的尺寸、形状和表面特性决定了节瘤缺陷的尺寸、边界结构的连续性和表面形貌特征。节瘤种子的来源主要有基底加工和清洗过程的残留物，镀膜过程中真空室的污染和蒸发材料的喷溅，并给出了相应的抑制方法。节瘤的电场增强效应是导致节瘤缺陷易损伤的另一个重要原因。节瘤缺陷的激光预处理和破坏坑的修复技术可以提高光学薄膜的抗激光损伤能力。